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Low Pressure Plasma Device - List of Manufacturers, Suppliers, Companies and Products

Low Pressure Plasma Device Product List

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Diener Electronic's "Plasma Treatment Device"

We sell various plasma devices, including low-pressure types that can accommodate a wide range of materials and atmospheric pressure types that can be installed inline.

We sell the "Low Pressure and Atmospheric Pressure Plasma Equipment" manufactured by Diener Electronic, which has a wealth of implementation experience in various fields, including semiconductors. Our lineup ranges from easy-to-handle, low-cost small experimental products to large machines with powerful processing capabilities. We offer a wide variety of models for both low pressure and atmospheric pressure types, allowing customers to choose according to their needs for research and development or small-scale production. 【Features】 ◎ Low Pressure Plasma Equipment  ■ Capable of plasma treatment for glass, metal, plastic, textiles, powders, and more  ■ Numerous implementations in research and development, as well as in mass production lines  ■ Various sizes of plasma chambers available to meet customer requirements ◎ Atmospheric Pressure Plasma Equipment  ■ Can be installed inline or mounted on robots  ■ Contributes to the removal of organic substances from work surfaces and improves adhesion through enhanced hydrophilicity  ■ Plasma can be generated using a 100V power supply and high-pressure air of 0.5MPa to 0.8MPa *For more details, please refer to the materials. Feel free to contact us with any inquiries.

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  • Plasma surface treatment equipment

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低圧プラズマ装置 粉体処理専用モデル

プログラム番号を選択後、ボタン1つでプラズマ処理完了。操作性がよく、どなたでも利用できて非常に便利です。

 Diener GmbH + Co. KGは、低圧プラズマ粉体システムを開発し、疎水性の機能性添加剤を恒久的に親水性にすることで、多くの先駆的な用途に向けた製品特性を改善することができるようになり、新製品開発に数多く携わってきた実績のある製品です。  例えば、親水化したPEパウダーは、金属とプラスチックの接合強度を高めることができます。この親水化は、低圧プラズマ処理によって実現され、処理条件はパウダーの粒子径に強く依存します。 プラズマ処理の時間は5分から数時間です。 処理時間中、処理温度が低く保たれるため、粉体への熱的なダメージはありません。同様に、融点、結晶化度、モル重量などの基本的な特性も影響を受けません。 幅広い可変プロセスパラメーターにより、さまざまなコーティング特性を実現することができます。  処理中は、ドラム型の真空チャンバー内で粉体を連続的に攪拌し、均一な処理を実現します。処理温度は約30℃と低く、粉体への熱ダメージや基本特性の変化はありません。  FEMTO、PICO、NANOはそれぞれボトル容量が異なり、処理量に合わせて装置モデルを選択することができます。

  • Fine Ceramics

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